Hestia Power Overview

  • Year Founded
  • 2019

Year Founded

  • Status
  • Private

  • Latest Deal Type
  • Series B

  • Latest Deal Amount
  • $72M

  • Investors
  • 16

Hestia Power General Information

Description

Developer of silicon carbide (SiC) and gallium nitride (GaN) semiconductor power devices. The company develops power semiconductors, wide-bandgap semiconductors, MOS tubes, and integrated circuits that utilizes SiC and GaN materials, enabling automobile enterprises, high-speed rail industry, aerospace industry to improve their technology and electronics.

Contact Information

Website
www.hestiapower.cn
Ownership Status
Privately Held (backing)
Financing Status
Venture Capital-Backed
Corporate Office
  • Room 702, No.439, Lane 1588
  • Zhuguang Road, Qingpu District
  • Shanghai
  • China
+86 021
Primary Industry
Production (Semiconductors)
Other Industries
Application Specific Semiconductors
Vertical(s)
Advanced Manufacturing, Manufacturing
Corporate Office
  • Room 702, No.439, Lane 1588
  • Zhuguang Road, Qingpu District
  • Shanghai
  • China
+86 021

Hestia Power Timeline

2022202320242025
Financing Round

Want detailed data on 3M+ companies?

What you see here scratches the surface

Request a free trial

Want to dig into this profile?

We’ll help you find what you need

Learn more

Hestia Power Valuation & Funding

Deal Type Date Amount Raised to Date Post-Val Status Stage
4. Early Stage VC (Series B) 24-May-2023 $72M Completed Generating Revenue
3. Early Stage VC (Series A) 28-Sep-2021 Completed Generating Revenue
2. Early Stage VC 11-Jan-2021 Completed Generating Revenue
1. Early Stage VC 04-Dec-2020 Completed Generating Revenue
To view Hestia Power’s complete valuation and funding history, request access »

Hestia Power Patents

  • 28

    Total Documents Applications and Grants

  • Total Patents Families

  • 28

    Granted

  • Pending

  • Expiring in next 12 mo

Hestia Power Recent Patent Activity

Publication ID Patent Title Status First Filing Date Technology (CPC) Citations
US-20220223730-A1 Silicon carbide semiconductor device Active 11-Jan-2021
US-11984499-B2 Silicon carbide semiconductor device Active 11-Jan-2021
US-20220190117-A1 Silicon carbide semiconductor device Active 11-Dec-2020
US-11869943-B2 Silicon carbide semiconductor device Active 11-Dec-2020
US-20210273636-A1 Silicon carbide power device, driving circuit and control method Active 02-Mar-2020 H03K17/162
To view Hestia Power’s complete patent history, request access »

Hestia Power Investors (16)

Investor Name Investor Type Holding Investor Since Participating Rounds
CCBT Private Equity Corporate Venture Capital Minority
Contemporary Amperex Technology Corporation Minority
GAC Capital Corporate Venture Capital Minority
Hefei Renfa New Energy Investment Venture Capital Minority
Lingang Sc-innovation Investment Venture Capital Minority
You’re viewing 5 of 16 investors. Get the full list »

Ready to get started?

Request a free trial

Hestia Power FAQs

  • When was Hestia Power founded?

    Hestia Power was founded in 2019.

  • Where is Hestia Power headquartered?

    Hestia Power is headquartered in Shanghai, China.

  • What industry is Hestia Power in?

    Hestia Power’s primary industry is Production (Semiconductors).

  • Is Hestia Power a private or public company?

    Hestia Power is a Private company.

  • What is Hestia Power’s current revenue?

    The current revenue for Hestia Power is .

  • How much funding has Hestia Power raised over time?

    Hestia Power has raised $165M.

  • Who are Hestia Power’s investors?

    CCBT Private Equity, Contemporary Amperex Technology, GAC Capital, Hefei Renfa New Energy Investment, and Lingang Sc-innovation Investment are 5 of 16 investors who have invested in Hestia Power.

Data Transparency

  • Meet our data hygiene team

    Discover how our experts ensure you’re getting the most accurate financial data in the industry.

    Read blog »

  • How PitchBook sources data

    Our data operations team has logged over 3.5 million hours researching, organizing, and integrating the information you need most.

    Discover our process »